waveguide_width
float32 0.5
2
| waveguide_height
float32 200
600
| cladding_material
stringclasses 3
values | cladding_thickness
float32 1
5
| deposition_method
stringclasses 3
values | etch_method
stringclasses 3
values | sidewall_roughness
float32 0.5
5
| annealing_params
stringclasses 4
values | wavelength
float32 1.5k
1.6k
| polarization
stringclasses 2
values | input_power
float32 -10
10
| temperature
float32 20
80
| bend_radius
float32 20
200
| device_length
float32 1
50
| insertion_loss
float32 0.53
26.5
| propagation_loss
float32 0.1
5
| coupling_efficiency_input
float32 40
90
| coupling_efficiency_output
float32 40
90
| scattering_loss
float32 0.01
0.5
| effective_index
float32 1.5
2
| mode_confinement_factor
float32 0.7
0.95
| batch_id
stringclasses 50
values | data_source
stringclasses 2
values | measurement_method
stringclasses 4
values | uncertainty
float32 0.01
0.2
|
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
1.798
| 579.530029
|
SiO2
| 2.25
|
Sputtering
|
RIE
| 3.9
|
900C_1hr
| 1,567.719971
|
TE
| -7.53
| 49.509998
| 165.919998
| 19.6
| 3.551
| 0.874
| 51.25
| 55.759998
| 0.478
| 1.526
| 0.808
|
BATCH_3
|
Measurement
|
OTDR
| 0.03
|
1.586
| 368.600006
|
Polymer
| 1.63
|
LPCVD
|
RIE
| 3.55
|
900C_1hr
| 1,508.51001
|
TE
| 2.57
| 78.389999
| 142.699997
| 5.11
| 3.909
| 4.963
| 66.239998
| 64.120003
| 0.326
| 1.842
| 0.842
|
BATCH_8
|
Synthetic
|
ring_resonance
| 0.036
|
1.984
| 566.059998
|
SiO2
| 4.6
|
LPCVD
|
Wet Etch
| 1.13
|
900C_3hr
| 1,597.449951
|
TM
| 8.4
| 62.110001
| 175.490005
| 8.25
| 4.364
| 3.964
| 74.519997
| 85.650002
| 0.193
| 1.565
| 0.86
|
BATCH_1
|
Measurement
|
microring_Q
| 0.113
|
0.568
| 422.619995
|
SiO2
| 2.21
|
LPCVD
|
Wet Etch
| 1.46
|
1000C_1hr
| 1,579.25
|
TM
| -7.91
| 31.52
| 83.720001
| 38.59
| 14.047
| 3.429
| 76.540001
| 79.650002
| 0.211
| 1.942
| 0.829
|
BATCH_31
|
Measurement
|
microring_Q
| 0.056
|
1.767
| 428.579987
|
Air
| 2.51
|
Sputtering
|
ICP
| 4.75
|
900C_1hr
| 1,500.77002
|
TE
| 2.58
| 20.9
| 67.919998
| 20.950001
| 8.393
| 3.747
| 68.309998
| 82.050003
| 0.354
| 1.621
| 0.767
|
BATCH_13
|
Measurement
|
cut-back
| 0.148
|
0.979
| 475.589996
|
Air
| 1.02
|
Sputtering
|
ICP
| 2.04
|
900C_3hr
| 1,553.27002
|
TM
| 2.52
| 26.1
| 137.539993
| 38.25
| 2.592
| 0.368
| 73.839996
| 80.720001
| 0.33
| 1.667
| 0.718
|
BATCH_20
|
Measurement
|
OTDR
| 0.035
|
1.326
| 429.73999
|
SiO2
| 3.48
|
Sputtering
|
ICP
| 1.7
|
1000C_1hr
| 1,539.869995
|
TM
| -0.62
| 49.610001
| 106.150002
| 33.43
| 10.726
| 2.909
| 68.57
| 43.029999
| 0.027
| 1.603
| 0.76
|
BATCH_42
|
Synthetic
|
ring_resonance
| 0.058
|
1.027
| 403.660004
|
Polymer
| 2.51
|
LPCVD
|
Wet Etch
| 4.84
|
No_Anneal
| 1,590.069946
|
TM
| 4.55
| 42.27
| 196.570007
| 41.220001
| 19.993
| 4.53
| 78.870003
| 81.589996
| 0.252
| 1.572
| 0.812
|
BATCH_12
|
Measurement
|
OTDR
| 0.053
|
1.69
| 263.440002
|
Air
| 1.84
|
LPCVD
|
RIE
| 0.92
|
900C_3hr
| 1,541.060059
|
TE
| -1.28
| 20.66
| 27.799999
| 24.74
| 5.53
| 2.005
| 46.150002
| 66.440002
| 0.272
| 1.96
| 0.934
|
BATCH_8
|
Measurement
|
microring_Q
| 0.072
|
1.154
| 307.190002
|
SiO2
| 2.37
|
PECVD
|
Wet Etch
| 0.52
|
No_Anneal
| 1,559.310059
|
TM
| -7.82
| 60.080002
| 159.809998
| 8.9
| 2.179
| 1.659
| 66.129997
| 76.629997
| 0.498
| 1.734
| 0.78
|
BATCH_2
|
Synthetic
|
OTDR
| 0.129
|
1.969
| 212.839996
|
Air
| 4.98
|
PECVD
|
ICP
| 0.62
|
No_Anneal
| 1,516.540039
|
TM
| -4.23
| 44.509998
| 126.400002
| 5.11
| 1.703
| 0.504
| 67.669998
| 59.849998
| 0.158
| 1.896
| 0.821
|
BATCH_22
|
Measurement
|
microring_Q
| 0.088
|
1.778
| 409.540009
|
Polymer
| 3.67
|
PECVD
|
Wet Etch
| 2.31
|
900C_3hr
| 1,505.680054
|
TE
| 9.54
| 21.540001
| 94.830002
| 21.66
| 4.798
| 1.563
| 49.150002
| 88.07
| 0.23
| 1.622
| 0.862
|
BATCH_18
|
Synthetic
|
cut-back
| 0.15
|
0.806
| 254.949997
|
SiO2
| 1.9
|
LPCVD
|
Wet Etch
| 0.91
|
No_Anneal
| 1,521.449951
|
TM
| -1.42
| 75.68
| 143.690002
| 29.219999
| 3.768
| 0.87
| 76.82
| 84.660004
| 0.374
| 1.527
| 0.792
|
BATCH_15
|
Measurement
|
ring_resonance
| 0.071
|
1.639
| 260.329987
|
Polymer
| 1.53
|
Sputtering
|
Wet Etch
| 1.79
|
900C_1hr
| 1,581.939941
|
TM
| -9.45
| 76.660004
| 141.419998
| 41.82
| 18.671
| 4.207
| 58.380001
| 77.540001
| 0.399
| 1.764
| 0.763
|
BATCH_37
|
Measurement
|
microring_Q
| 0.141
|
1.77
| 525.690002
|
Polymer
| 4.65
|
LPCVD
|
Wet Etch
| 4.88
|
900C_1hr
| 1,576.030029
|
TE
| 6.41
| 77.839996
| 76
| 10.12
| 3.819
| 3.223
| 74.940002
| 66.169998
| 0.224
| 1.54
| 0.757
|
BATCH_20
|
Measurement
|
cut-back
| 0.107
|
0.773
| 476.230011
|
Polymer
| 2.55
|
PECVD
|
Wet Etch
| 0.67
|
900C_3hr
| 1,588.699951
|
TE
| 9.83
| 75.690002
| 182.679993
| 27.25
| 5.251
| 1.504
| 82.440002
| 55.389999
| 0.075
| 1.997
| 0.709
|
BATCH_8
|
Measurement
|
ring_resonance
| 0.078
|
1.059
| 539.659973
|
Air
| 2.86
|
PECVD
|
ICP
| 0.5
|
1000C_1hr
| 1,584.839966
|
TE
| -2.69
| 37.41
| 72.849998
| 33.029999
| 4.975
| 1.154
| 87.309998
| 58.75
| 0.17
| 1.852
| 0.882
|
BATCH_37
|
Measurement
|
OTDR
| 0.098
|
1.436
| 244.029999
|
Polymer
| 4.36
|
Sputtering
|
ICP
| 0.95
|
No_Anneal
| 1,508.01001
|
TM
| -9.78
| 32.810001
| 40.119999
| 31.98
| 9.908
| 2.789
| 84.169998
| 48.169998
| 0.268
| 1.594
| 0.946
|
BATCH_38
|
Synthetic
|
ring_resonance
| 0.152
|
1.625
| 495.279999
|
Air
| 3.74
|
LPCVD
|
Wet Etch
| 3.93
|
900C_1hr
| 1,573.109985
|
TM
| -9.71
| 49.490002
| 197.710007
| 43
| 14.503
| 2.947
| 41.23
| 68.089996
| 0.229
| 1.627
| 0.706
|
BATCH_27
|
Synthetic
|
microring_Q
| 0.09
|
1.071
| 554.27002
|
Air
| 2.78
|
LPCVD
|
Wet Etch
| 2.26
|
No_Anneal
| 1,511.209961
|
TM
| 8.57
| 27.370001
| 79.959999
| 30.690001
| 6.917
| 2.084
| 40.18
| 70.059998
| 0.349
| 1.572
| 0.94
|
BATCH_14
|
Measurement
|
ring_resonance
| 0.156
|
0.778
| 373.420013
|
Air
| 3.84
|
PECVD
|
Wet Etch
| 3.32
|
900C_3hr
| 1,575.459961
|
TM
| 6.58
| 73.900002
| 80.730003
| 49.82
| 19.83
| 3.703
| 76.160004
| 64.550003
| 0.048
| 1.954
| 0.851
|
BATCH_15
|
Measurement
|
microring_Q
| 0.035
|
0.515
| 509.51001
|
Polymer
| 2.8
|
Sputtering
|
ICP
| 2.25
|
1000C_1hr
| 1,526.01001
|
TE
| 0.36
| 62.200001
| 32.619999
| 21.65
| 10.999
| 4.27
| 42.880001
| 89.510002
| 0.09
| 1.93
| 0.919
|
BATCH_31
|
Synthetic
|
cut-back
| 0.186
|
1.855
| 443.339996
|
SiO2
| 1.98
|
Sputtering
|
Wet Etch
| 4.42
|
1000C_1hr
| 1,553.290039
|
TE
| -3.63
| 70.290001
| 141.320007
| 35.459999
| 12.097
| 3.09
| 44.919998
| 66.050003
| 0.27
| 1.901
| 0.791
|
BATCH_11
|
Synthetic
|
OTDR
| 0.032
|
1.414
| 369.730011
|
Polymer
| 3.87
|
LPCVD
|
RIE
| 4.67
|
1000C_1hr
| 1,519.890015
|
TM
| 6.76
| 51.830002
| 73.239998
| 20.01
| 3.962
| 1.63
| 50.889999
| 60.919998
| 0.381
| 1.895
| 0.918
|
BATCH_8
|
Synthetic
|
ring_resonance
| 0.087
|
0.632
| 282.730011
|
Air
| 3.3
|
LPCVD
|
Wet Etch
| 2.28
|
1000C_1hr
| 1,505.25
|
TE
| -1.03
| 32.880001
| 192.110001
| 39
| 5.966
| 1.189
| 44.619999
| 60.73
| 0.32
| 1.624
| 0.836
|
BATCH_48
|
Synthetic
|
microring_Q
| 0.156
|
1.112
| 438.359985
|
Air
| 1.26
|
LPCVD
|
RIE
| 0.87
|
900C_1hr
| 1,564.880005
|
TM
| -6.84
| 61.810001
| 70.629997
| 26.83
| 3.271
| 0.805
| 78.82
| 69.139999
| 0.343
| 1.797
| 0.863
|
BATCH_6
|
Measurement
|
ring_resonance
| 0.124
|
1.048
| 454.170013
|
Air
| 2.59
|
Sputtering
|
RIE
| 1.49
|
900C_3hr
| 1,581.52002
|
TE
| 4.5
| 28.110001
| 163.729996
| 28.709999
| 11.374
| 3.413
| 62.599998
| 73.279999
| 0.169
| 1.976
| 0.835
|
BATCH_35
|
Synthetic
|
microring_Q
| 0.086
|
1.337
| 291.679993
|
SiO2
| 2.96
|
Sputtering
|
ICP
| 0.67
|
900C_1hr
| 1,582.449951
|
TE
| -6.39
| 27.4
| 35.029999
| 23.969999
| 13.07
| 4.939
| 87.080002
| 54.889999
| 0.334
| 1.829
| 0.711
|
BATCH_39
|
Synthetic
|
cut-back
| 0.17
|
0.534
| 569.690002
|
Polymer
| 4.61
|
PECVD
|
ICP
| 0.9
|
900C_1hr
| 1,500.050049
|
TE
| 8.61
| 48.91
| 196.419998
| 45.02
| 11.653
| 2.474
| 78.839996
| 64.080002
| 0.407
| 1.676
| 0.904
|
BATCH_8
|
Measurement
|
OTDR
| 0.06
|
0.801
| 534.140015
|
Polymer
| 1.03
|
PECVD
|
RIE
| 4.87
|
No_Anneal
| 1,500.51001
|
TM
| -0.2
| 49.709999
| 22.77
| 19.549999
| 3.955
| 1.353
| 88.040001
| 44.799999
| 0.435
| 1.591
| 0.72
|
BATCH_4
|
Measurement
|
microring_Q
| 0.048
|
0.97
| 556.650024
|
Polymer
| 1.11
|
PECVD
|
ICP
| 4.88
|
900C_3hr
| 1,560.089966
|
TE
| -1.19
| 63.369999
| 117.650002
| 49.740002
| 10.218
| 1.901
| 82.410004
| 49.549999
| 0.284
| 1.863
| 0.948
|
BATCH_31
|
Measurement
|
microring_Q
| 0.161
|
1.865
| 213.449997
|
SiO2
| 4.88
|
Sputtering
|
ICP
| 3.08
|
900C_1hr
| 1,528.109985
|
TE
| -5.34
| 47.84
| 184.460007
| 19.99
| 3.145
| 0.669
| 83.190002
| 48.580002
| 0.389
| 1.939
| 0.878
|
BATCH_5
|
Measurement
|
microring_Q
| 0.116
|
1.288
| 391.109985
|
SiO2
| 1.04
|
PECVD
|
ICP
| 3.98
|
1000C_1hr
| 1,565.23999
|
TE
| 9.63
| 39.639999
| 49.169998
| 13.38
| 2.931
| 1.679
| 54.400002
| 53.970001
| 0.266
| 1.632
| 0.741
|
BATCH_43
|
Synthetic
|
ring_resonance
| 0.167
|
0.931
| 328.959991
|
Air
| 4.38
|
PECVD
|
ICP
| 3.85
|
No_Anneal
| 1,505.619995
|
TE
| -9.95
| 20.450001
| 140.490005
| 2.91
| 2.423
| 2.181
| 70.650002
| 83.879997
| 0.214
| 1.918
| 0.935
|
BATCH_48
|
Measurement
|
ring_resonance
| 0.168
|
0.874
| 279.179993
|
Polymer
| 1.29
|
LPCVD
|
RIE
| 1.58
|
No_Anneal
| 1,546.27002
|
TM
| 4.08
| 21.41
| 78.730003
| 5.09
| 2.041
| 0.611
| 53.32
| 61.529999
| 0.065
| 1.803
| 0.884
|
BATCH_26
|
Measurement
|
OTDR
| 0.176
|
1.441
| 554.52002
|
Polymer
| 4.8
|
PECVD
|
RIE
| 4.64
|
1000C_1hr
| 1,510
|
TM
| 0.54
| 29.889999
| 96.480003
| 36.77
| 13.668
| 3.215
| 73.519997
| 48.959999
| 0.401
| 1.775
| 0.848
|
BATCH_23
|
Measurement
|
microring_Q
| 0.188
|
1.59
| 561.26001
|
Polymer
| 3.9
|
Sputtering
|
Wet Etch
| 4.45
|
No_Anneal
| 1,550.900024
|
TE
| 9.5
| 40.52
| 136.199997
| 33.400002
| 12.852
| 3.633
| 44.650002
| 52.639999
| 0.207
| 1.659
| 0.837
|
BATCH_32
|
Measurement
|
microring_Q
| 0.047
|
1.268
| 463.920013
|
SiO2
| 3.07
|
Sputtering
|
ICP
| 2.36
|
900C_1hr
| 1,516.329956
|
TE
| 1.84
| 74.839996
| 75.370003
| 33.669998
| 3.91
| 0.868
| 88.089996
| 66.440002
| 0.428
| 1.891
| 0.797
|
BATCH_38
|
Measurement
|
microring_Q
| 0.179
|
1.452
| 475.149994
|
SiO2
| 2.98
|
Sputtering
|
ICP
| 2.44
|
No_Anneal
| 1,561.98999
|
TM
| 3.63
| 21.870001
| 72.580002
| 31.08
| 7.114
| 2.081
| 66.129997
| 40.669998
| 0.081
| 1.717
| 0.861
|
BATCH_47
|
Synthetic
|
ring_resonance
| 0.175
|
1.287
| 224.190002
|
Polymer
| 2.09
|
PECVD
|
RIE
| 1.16
|
No_Anneal
| 1,501.459961
|
TE
| -7.71
| 70.82
| 75.190002
| 31.08
| 8.341
| 2.132
| 73.089996
| 70.269997
| 0.444
| 1.874
| 0.945
|
BATCH_7
|
Measurement
|
cut-back
| 0.06
|
0.631
| 475.859985
|
Air
| 1.12
|
Sputtering
|
ICP
| 2.95
|
No_Anneal
| 1,575.290039
|
TE
| 9.17
| 71.459999
| 65.360001
| 7.76
| 3.424
| 2.498
| 75.669998
| 68.199997
| 0.357
| 1.928
| 0.872
|
BATCH_27
|
Measurement
|
cut-back
| 0.157
|
0.764
| 360.149994
|
Polymer
| 4.45
|
Sputtering
|
Wet Etch
| 2.71
|
No_Anneal
| 1,575.329956
|
TE
| 7.18
| 35.07
| 89.849998
| 15.65
| 1.244
| 0.227
| 49.68
| 66.010002
| 0.019
| 1.628
| 0.723
|
BATCH_11
|
Synthetic
|
ring_resonance
| 0.09
|
0.874
| 222.220001
|
SiO2
| 2.5
|
LPCVD
|
RIE
| 3.19
|
900C_3hr
| 1,566.869995
|
TE
| 1.39
| 59.119999
| 172.889999
| 16.809999
| 4.711
| 2.375
| 81.379997
| 65.860001
| 0.424
| 1.933
| 0.837
|
BATCH_33
|
Synthetic
|
cut-back
| 0.092
|
1.386
| 349.619995
|
Polymer
| 2.33
|
PECVD
|
Wet Etch
| 2.01
|
900C_1hr
| 1,586.76001
|
TE
| -3.32
| 26.15
| 82.309998
| 38.02
| 15.801
| 3.776
| 55.099998
| 89.300003
| 0.186
| 1.504
| 0.744
|
BATCH_46
|
Synthetic
|
OTDR
| 0.157
|
1.994
| 403.25
|
Polymer
| 3.15
|
LPCVD
|
ICP
| 3.76
|
1000C_1hr
| 1,591.589966
|
TM
| 5.34
| 53.630001
| 131.589996
| 45.25
| 16.965
| 3.56
| 60.459999
| 80.949997
| 0.211
| 1.965
| 0.747
|
BATCH_10
|
Measurement
|
OTDR
| 0.15
|
1.738
| 557.619995
|
Polymer
| 2.59
|
Sputtering
|
Wet Etch
| 1.57
|
900C_1hr
| 1,557.660034
|
TM
| -0.9
| 32.639999
| 134.800003
| 43.91
| 7.849
| 1.346
| 66.129997
| 57.029999
| 0.419
| 1.58
| 0.882
|
BATCH_20
|
Measurement
|
ring_resonance
| 0.152
|
1.715
| 526.210022
|
Air
| 4.72
|
LPCVD
|
ICP
| 0.52
|
1000C_1hr
| 1,561.290039
|
TE
| -3.15
| 79.82
| 197.149994
| 46.68
| 6.781
| 1.152
| 72.690002
| 75.529999
| 0.324
| 1.885
| 0.888
|
BATCH_28
|
Measurement
|
cut-back
| 0.156
|
1.744
| 263.700012
|
SiO2
| 1.66
|
Sputtering
|
RIE
| 1.95
|
No_Anneal
| 1,594.329956
|
TM
| 2.55
| 37.509998
| 20.73
| 25.34
| 8.85
| 2.81
| 79.730003
| 54.209999
| 0.357
| 1.571
| 0.941
|
BATCH_23
|
Synthetic
|
microring_Q
| 0.105
|
1.919
| 512.320007
|
SiO2
| 4.68
|
PECVD
|
RIE
| 2.41
|
1000C_1hr
| 1,561.47998
|
TM
| 1.05
| 77.099998
| 33.959999
| 9.92
| 5.013
| 4.241
| 62.77
| 74.389999
| 0.15
| 1.724
| 0.907
|
BATCH_44
|
Synthetic
|
OTDR
| 0.186
|
0.94
| 347.040009
|
SiO2
| 4.05
|
Sputtering
|
ICP
| 1.27
|
1000C_1hr
| 1,590.969971
|
TM
| 9.97
| 43.5
| 112.029999
| 45.490002
| 18.183001
| 3.598
| 43.099998
| 76.32
| 0.241
| 1.732
| 0.79
|
BATCH_20
|
Measurement
|
microring_Q
| 0.107
|
1.592
| 374.559998
|
Polymer
| 4.79
|
LPCVD
|
ICP
| 4.65
|
1000C_1hr
| 1,578.819946
|
TE
| 9.97
| 37.860001
| 187.350006
| 17.65
| 4.423
| 1.459
| 53.189999
| 45.59
| 0.298
| 1.536
| 0.899
|
BATCH_37
|
Measurement
|
ring_resonance
| 0.034
|
1.768
| 498.549988
|
SiO2
| 1.86
|
PECVD
|
Wet Etch
| 2.93
|
No_Anneal
| 1,592.75
|
TE
| -1.98
| 22.24
| 172.479996
| 22.450001
| 4.906
| 1.341
| 67.529999
| 81.860001
| 0.188
| 1.68
| 0.871
|
BATCH_25
|
Synthetic
|
OTDR
| 0.113
|
1.456
| 245.309998
|
Air
| 1.62
|
LPCVD
|
ICP
| 2.64
|
1000C_1hr
| 1,516.369995
|
TM
| 8.28
| 36
| 143.449997
| 46.93
| 4.231
| 0.701
| 53.779999
| 83.349998
| 0.476
| 1.674
| 0.76
|
BATCH_23
|
Synthetic
|
cut-back
| 0.13
|
1.695
| 466.829987
|
Air
| 3.39
|
Sputtering
|
RIE
| 3.66
|
1000C_1hr
| 1,539.599976
|
TM
| 2.17
| 59.490002
| 116.5
| 38.27
| 14.577
| 3.481
| 69.620003
| 80.459999
| 0.192
| 1.726
| 0.756
|
BATCH_9
|
Measurement
|
cut-back
| 0.164
|
0.688
| 508.130005
|
SiO2
| 3.68
|
PECVD
|
RIE
| 4.46
|
900C_1hr
| 1,547.060059
|
TE
| 7.46
| 30.43
| 79.959999
| 29.889999
| 9.734
| 2.659
| 70.150002
| 73.230003
| 0.107
| 1.922
| 0.915
|
BATCH_43
|
Measurement
|
microring_Q
| 0.122
|
1.331
| 303.790009
|
Air
| 3.65
|
PECVD
|
RIE
| 2.52
|
900C_3hr
| 1,535.459961
|
TM
| -2.47
| 54.220001
| 172.009995
| 6.42
| 2.325
| 2.72
| 79.040001
| 73.269997
| 0.218
| 1.884
| 0.925
|
BATCH_19
|
Synthetic
|
OTDR
| 0.012
|
1.097
| 512.76001
|
Air
| 3.17
|
PECVD
|
RIE
| 3.17
|
No_Anneal
| 1,538.119995
|
TM
| 0.43
| 46.720001
| 114.82
| 20.879999
| 3.097
| 0.741
| 72.239998
| 43.689999
| 0.155
| 1.814
| 0.805
|
BATCH_1
|
Synthetic
|
cut-back
| 0.086
|
0.559
| 567.26001
|
Polymer
| 4.77
|
PECVD
|
Wet Etch
| 3.54
|
900C_1hr
| 1,514.97998
|
TE
| -9.35
| 40.490002
| 162.789993
| 27.280001
| 5.415
| 1.78
| 59.720001
| 67.779999
| 0.46
| 1.655
| 0.866
|
BATCH_44
|
Measurement
|
microring_Q
| 0.123
|
0.646
| 469.880005
|
SiO2
| 3.75
|
LPCVD
|
RIE
| 0.55
|
900C_3hr
| 1,596.310059
|
TM
| -4.91
| 21.77
| 68.099998
| 7.77
| 2.057
| 1.576
| 56.259998
| 51.02
| 0.241
| 1.561
| 0.833
|
BATCH_21
|
Measurement
|
OTDR
| 0.086
|
1.169
| 325.190002
|
Air
| 4.33
|
Sputtering
|
ICP
| 4.76
|
No_Anneal
| 1,587.52002
|
TE
| -6.17
| 59.830002
| 196.009995
| 45.189999
| 14.811
| 3.157
| 52.900002
| 85.980003
| 0.452
| 1.794
| 0.758
|
BATCH_25
|
Synthetic
|
OTDR
| 0.181
|
0.916
| 566.080017
|
SiO2
| 4.31
|
LPCVD
|
RIE
| 4.78
|
1000C_1hr
| 1,522.219971
|
TE
| -6.45
| 43.099998
| 37.139999
| 49.16
| 16.556
| 2.982
| 44.16
| 79.800003
| 0.407
| 1.514
| 0.868
|
BATCH_41
|
Measurement
|
ring_resonance
| 0.026
|
1.758
| 469.779999
|
Polymer
| 4.47
|
PECVD
|
Wet Etch
| 3.72
|
900C_1hr
| 1,503.060059
|
TE
| -0.2
| 61.25
| 179
| 46.669998
| 12.703
| 2.526
| 85.419998
| 50.599998
| 0.344
| 1.625
| 0.817
|
BATCH_32
|
Measurement
|
OTDR
| 0.061
|
1.384
| 589.72998
|
Polymer
| 1.54
|
PECVD
|
Wet Etch
| 0.91
|
900C_1hr
| 1,524.069946
|
TM
| 3.47
| 44.439999
| 62.25
| 36.619999
| 15.182
| 3.73
| 63.130001
| 50.98
| 0.03
| 1.75
| 0.854
|
BATCH_44
|
Measurement
|
OTDR
| 0.125
|
1.511
| 470.429993
|
Polymer
| 2.17
|
PECVD
|
Wet Etch
| 0.55
|
900C_1hr
| 1,511.079956
|
TM
| 9.91
| 61.98
| 107.839996
| 6.8
| 3.707
| 4.114
| 85.660004
| 73.580002
| 0.113
| 1.937
| 0.939
|
BATCH_38
|
Synthetic
|
OTDR
| 0.095
|
0.889
| 560.080017
|
Polymer
| 1.29
|
LPCVD
|
Wet Etch
| 2.71
|
900C_3hr
| 1,559.939941
|
TE
| -2.47
| 43.759998
| 136.490005
| 40.060001
| 5.553
| 0.932
| 44.689999
| 71.690002
| 0.222
| 1.881
| 0.909
|
BATCH_41
|
Synthetic
|
cut-back
| 0.13
|
1.312
| 277.570007
|
Air
| 2.25
|
PECVD
|
ICP
| 2.67
|
900C_3hr
| 1,558.109985
|
TM
| -7.28
| 78.239998
| 187.509995
| 14.91
| 2.775
| 1.369
| 85.400002
| 54.650002
| 0.381
| 1.779
| 0.739
|
BATCH_8
|
Synthetic
|
microring_Q
| 0.186
|
1.018
| 278.799988
|
Polymer
| 3.26
|
PECVD
|
Wet Etch
| 0.92
|
No_Anneal
| 1,530.530029
|
TM
| 7.78
| 49.220001
| 37.419998
| 26.01
| 13.823
| 4.564
| 56.369999
| 66.800003
| 0.462
| 1.658
| 0.79
|
BATCH_48
|
Synthetic
|
microring_Q
| 0.172
|
1.221
| 495.799988
|
SiO2
| 1.12
|
PECVD
|
RIE
| 2.97
|
No_Anneal
| 1,563.329956
|
TM
| -6.54
| 54.91
| 21.84
| 11.58
| 1.837
| 0.265
| 40.439999
| 73.480003
| 0.189
| 1.96
| 0.745
|
BATCH_47
|
Synthetic
|
OTDR
| 0.192
|
1.374
| 234.229996
|
Air
| 4.96
|
PECVD
|
ICP
| 2.74
|
1000C_1hr
| 1,584.680054
|
TM
| -3.99
| 61.939999
| 63.330002
| 14.24
| 1.747
| 0.326
| 60.349998
| 68.419998
| 0.042
| 1.706
| 0.816
|
BATCH_24
|
Measurement
|
cut-back
| 0.089
|
1.128
| 384.470001
|
SiO2
| 2.01
|
PECVD
|
RIE
| 3.09
|
900C_1hr
| 1,543.959961
|
TE
| 7.38
| 21.940001
| 73.209999
| 49.09
| 21.909
| 4.351
| 53.119999
| 40.07
| 0.389
| 1.897
| 0.891
|
BATCH_13
|
Synthetic
|
OTDR
| 0.098
|
1.191
| 400.859985
|
SiO2
| 4.96
|
Sputtering
|
ICP
| 4.88
|
900C_3hr
| 1,529.420044
|
TE
| -4.29
| 26.67
| 79.169998
| 28.34
| 9.818
| 3.102
| 60.52
| 47.970001
| 0.233
| 1.953
| 0.916
|
BATCH_3
|
Measurement
|
ring_resonance
| 0.132
|
1.319
| 598.98999
|
Air
| 4.53
|
Sputtering
|
Wet Etch
| 4.68
|
900C_3hr
| 1,596.530029
|
TE
| -2.18
| 61.490002
| 134.740005
| 25.120001
| 10.476
| 3.716
| 82.25
| 82.220001
| 0.267
| 1.872
| 0.868
|
BATCH_4
|
Synthetic
|
cut-back
| 0.014
|
1.929
| 328.700012
|
Polymer
| 2.6
|
LPCVD
|
RIE
| 1.54
|
1000C_1hr
| 1,510.719971
|
TE
| -0.36
| 36.779999
| 146.009995
| 42.880001
| 9.239
| 1.875
| 85.010002
| 65.279999
| 0.316
| 1.728
| 0.897
|
BATCH_49
|
Synthetic
|
ring_resonance
| 0.118
|
1.857
| 438.290009
|
SiO2
| 2.05
|
LPCVD
|
RIE
| 3.24
|
900C_3hr
| 1,540.640015
|
TE
| -7.09
| 41.330002
| 24.91
| 30.93
| 13.795
| 4.249
| 84.620003
| 64.269997
| 0.074
| 1.602
| 0.829
|
BATCH_9
|
Synthetic
|
ring_resonance
| 0.06
|
1.199
| 367.929993
|
Air
| 2.77
|
LPCVD
|
RIE
| 3.72
|
900C_1hr
| 1,584.900024
|
TM
| 6.88
| 54.68
| 130.679993
| 31.58
| 14.801
| 4.207
| 75.260002
| 42.990002
| 0.36
| 1.553
| 0.889
|
BATCH_26
|
Synthetic
|
microring_Q
| 0.034
|
1.602
| 392.839996
|
Air
| 4.59
|
Sputtering
|
RIE
| 3.49
|
1000C_1hr
| 1,522.199951
|
TE
| 7.43
| 30.209999
| 164.479996
| 27.530001
| 5.878
| 1.687
| 41.459999
| 47.330002
| 0.019
| 1.619
| 0.799
|
BATCH_35
|
Synthetic
|
ring_resonance
| 0.196
|
1.231
| 373.179993
|
Air
| 3.51
|
Sputtering
|
RIE
| 2.56
|
900C_3hr
| 1,567.180054
|
TM
| -7.6
| 73.230003
| 93.300003
| 4.46
| 2.239
| 0.895
| 55.630001
| 74.699997
| 0.155
| 1.578
| 0.895
|
BATCH_33
|
Synthetic
|
cut-back
| 0.185
|
1.358
| 254.330002
|
Air
| 4.87
|
PECVD
|
Wet Etch
| 4.44
|
No_Anneal
| 1,544.819946
|
TE
| -3.78
| 53.150002
| 123.589996
| 4.22
| 2.552
| 1.629
| 62.25
| 52.209999
| 0.075
| 1.945
| 0.904
|
BATCH_27
|
Measurement
|
ring_resonance
| 0.071
|
1.248
| 550.909973
|
Polymer
| 1.82
|
Sputtering
|
RIE
| 0.86
|
900C_1hr
| 1,565.180054
|
TM
| 7.57
| 33.580002
| 166.440002
| 23.620001
| 7.153
| 2.331
| 88.900002
| 66.650002
| 0.073
| 1.649
| 0.702
|
BATCH_23
|
Synthetic
|
OTDR
| 0.136
|
1.406
| 593.01001
|
SiO2
| 4.16
|
PECVD
|
ICP
| 1.23
|
1000C_1hr
| 1,593.650024
|
TM
| -2.23
| 59.849998
| 131.580002
| 32.32
| 14.653
| 4.156
| 53.650002
| 81.120003
| 0.205
| 1.669
| 0.728
|
BATCH_18
|
Measurement
|
cut-back
| 0.198
|
1.777
| 411.76001
|
SiO2
| 1.06
|
LPCVD
|
ICP
| 1.73
|
900C_1hr
| 1,539.5
|
TE
| 9.42
| 46.27
| 83.790001
| 24.379999
| 9.057
| 3.167
| 50.650002
| 62.419998
| 0.024
| 1.979
| 0.714
|
BATCH_36
|
Synthetic
|
ring_resonance
| 0.035
|
1.933
| 585.690002
|
Air
| 1.69
|
PECVD
|
ICP
| 4.55
|
900C_1hr
| 1,593.560059
|
TE
| 7.76
| 69.900002
| 107.790001
| 19.83
| 1.874
| 0.55
| 57.400002
| 81.769997
| 0.24
| 1.513
| 0.87
|
BATCH_11
|
Measurement
|
ring_resonance
| 0.12
|
0.924
| 316.320007
|
SiO2
| 3.36
|
PECVD
|
Wet Etch
| 3.23
|
900C_1hr
| 1,518.170044
|
TM
| -6.83
| 61
| 88.919998
| 29.120001
| 10.486
| 3.31
| 48.560001
| 87.720001
| 0.035
| 1.907
| 0.891
|
BATCH_3
|
Synthetic
|
microring_Q
| 0.053
|
1.107
| 452.880005
|
SiO2
| 4.99
|
Sputtering
|
Wet Etch
| 1.18
|
1000C_1hr
| 1,531.130005
|
TM
| -2.56
| 52.709999
| 31.23
| 21.879999
| 9.084
| 3.653
| 75.889999
| 57.279999
| 0.142
| 1.881
| 0.928
|
BATCH_10
|
Measurement
|
cut-back
| 0.159
|
1.685
| 464.429993
|
Polymer
| 2.73
|
LPCVD
|
Wet Etch
| 4.81
|
1000C_1hr
| 1,578.589966
|
TM
| 9.62
| 43.18
| 32.939999
| 16.459999
| 2.942
| 0.776
| 42.84
| 49.16
| 0.045
| 1.996
| 0.859
|
BATCH_39
|
Measurement
|
OTDR
| 0.013
|
1.654
| 318.410004
|
Polymer
| 3.99
|
Sputtering
|
RIE
| 3.41
|
900C_1hr
| 1,503.47998
|
TM
| -0.6
| 34.189999
| 52.389999
| 2.9
| 2
| 4.691
| 66.230003
| 60.82
| 0.059
| 1.986
| 0.913
|
BATCH_4
|
Synthetic
|
microring_Q
| 0.143
|
1.767
| 281.359985
|
Air
| 2.18
|
Sputtering
|
Wet Etch
| 3.94
|
900C_3hr
| 1,508.530029
|
TM
| -9.79
| 77.209999
| 80.589996
| 35.91
| 18.226999
| 4.894
| 78.290001
| 68.769997
| 0.028
| 1.755
| 0.7
|
BATCH_9
|
Measurement
|
microring_Q
| 0.134
|
1.648
| 342.98999
|
Air
| 1.79
|
PECVD
|
RIE
| 4.29
|
900C_1hr
| 1,502.910034
|
TE
| -5.88
| 24.129999
| 128.649994
| 2.33
| 2.17
| 2.789
| 89.190002
| 78.800003
| 0.468
| 1.668
| 0.84
|
BATCH_45
|
Synthetic
|
OTDR
| 0.138
|
1.906
| 548.830017
|
Air
| 4.83
|
LPCVD
|
Wet Etch
| 0.59
|
900C_3hr
| 1,565.219971
|
TE
| 8.94
| 31.879999
| 198.929993
| 37.23
| 7.326
| 1.726
| 50.580002
| 88.089996
| 0.401
| 1.709
| 0.779
|
BATCH_1
|
Synthetic
|
ring_resonance
| 0.153
|
1.971
| 346.089996
|
Polymer
| 4.51
|
Sputtering
|
Wet Etch
| 0.55
|
900C_3hr
| 1,577.599976
|
TE
| 3.3
| 29.85
| 35.110001
| 4.29
| 3.877
| 4.845
| 80.059998
| 55.5
| 0.169
| 1.922
| 0.9
|
BATCH_32
|
Synthetic
|
OTDR
| 0.131
|
0.789
| 222.479996
|
SiO2
| 4.04
|
Sputtering
|
ICP
| 1.05
|
900C_3hr
| 1,578.060059
|
TE
| -8.79
| 20.809999
| 26.48
| 40.66
| 3.745
| 0.647
| 43.720001
| 52.400002
| 0.294
| 1.904
| 0.936
|
BATCH_7
|
Synthetic
|
ring_resonance
| 0.156
|
1.439
| 367.179993
|
SiO2
| 1.98
|
PECVD
|
Wet Etch
| 3.57
|
900C_3hr
| 1,527.099976
|
TE
| 2.16
| 54.889999
| 146.029999
| 47.41
| 6.437
| 1.032
| 64.870003
| 46.91
| 0.379
| 1.531
| 0.817
|
BATCH_48
|
Synthetic
|
microring_Q
| 0.199
|
1.989
| 491.920013
|
Air
| 4.25
|
Sputtering
|
RIE
| 2.61
|
900C_1hr
| 1,598.459961
|
TE
| 2.09
| 43.869999
| 184.520004
| 18.27
| 8.059
| 3.341
| 57.099998
| 84.050003
| 0.105
| 1.63
| 0.82
|
BATCH_24
|
Synthetic
|
ring_resonance
| 0.068
|
1.439
| 409.459991
|
SiO2
| 4.39
|
PECVD
|
ICP
| 2.24
|
900C_1hr
| 1,577.449951
|
TM
| 2.52
| 69.980003
| 172.979996
| 15.26
| 3.741
| 1.945
| 83.650002
| 52.470001
| 0.058
| 1.666
| 0.898
|
BATCH_2
|
Synthetic
|
ring_resonance
| 0.115
|
1.315
| 307.269989
|
SiO2
| 3.79
|
PECVD
|
Wet Etch
| 2.79
|
No_Anneal
| 1,508.170044
|
TE
| -0.62
| 39.27
| 163.389999
| 14.55
| 5.256
| 3.114
| 67.5
| 60.25
| 0.132
| 1.904
| 0.93
|
BATCH_6
|
Measurement
|
ring_resonance
| 0.122
|
1.788
| 270.309998
|
Air
| 2.74
|
LPCVD
|
RIE
| 3.38
|
900C_3hr
| 1,541.26001
|
TM
| -9.1
| 63.799999
| 192.669998
| 22.84
| 3.274
| 0.629
| 47.16
| 50.57
| 0.451
| 1.511
| 0.726
|
BATCH_48
|
Measurement
|
OTDR
| 0.12
|
1.513
| 398.480011
|
SiO2
| 3.83
|
LPCVD
|
RIE
| 0.68
|
900C_1hr
| 1,525.069946
|
TM
| 0.68
| 22.969999
| 24.459999
| 35.82
| 15.125
| 3.731
| 89.389999
| 40.189999
| 0.274
| 1.737
| 0.782
|
BATCH_9
|
Measurement
|
OTDR
| 0.042
|
0.723
| 520.799988
|
Air
| 3.59
|
LPCVD
|
RIE
| 4
|
No_Anneal
| 1,540.109985
|
TM
| 3.02
| 31.219999
| 34.77
| 38.080002
| 3.249
| 0.354
| 53.040001
| 88.290001
| 0.415
| 1.511
| 0.805
|
BATCH_3
|
Synthetic
|
ring_resonance
| 0.135
|
1.206
| 507.019989
|
Polymer
| 4.65
|
LPCVD
|
ICP
| 3.2
|
1000C_1hr
| 1,502.880005
|
TE
| -5.31
| 35.599998
| 22.17
| 34.040001
| 16.757
| 4.393
| 52.400002
| 56.459999
| 0.346
| 1.643
| 0.881
|
BATCH_38
|
Synthetic
|
cut-back
| 0.108
|
0.793
| 511.049988
|
Air
| 2.15
|
PECVD
|
Wet Etch
| 1.28
|
900C_1hr
| 1,511.430054
|
TM
| -7.79
| 20.09
| 60.939999
| 18.790001
| 10.791
| 4.874
| 49.860001
| 54.41
| 0.486
| 1.777
| 0.911
|
BATCH_31
|
Synthetic
|
microring_Q
| 0.05
|
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