Datasets:
waveguide_width
float32 0.5
2
| waveguide_height
float32 200
600
| cladding_material
stringclasses 3
values | cladding_thickness
float32 1
5
| deposition_method
stringclasses 3
values | etch_method
stringclasses 3
values | sidewall_roughness
float32 0.5
5
| annealing_params
stringclasses 4
values | wavelength
float32 1.5k
1.6k
| polarization
stringclasses 2
values | input_power
float32 -10
10
| temperature
float32 20
80
| bend_radius
float32 20
200
| device_length
float32 1
50
| insertion_loss
float32 0.53
26.5
| propagation_loss
float32 0.1
5
| coupling_efficiency_input
float32 40
90
| coupling_efficiency_output
float32 40
90
| scattering_loss
float32 0.01
0.5
| effective_index
float32 1.5
2
| mode_confinement_factor
float32 0.7
0.95
| batch_id
stringclasses 50
values | data_source
stringclasses 2
values | measurement_method
stringclasses 4
values | uncertainty
float32 0.01
0.2
|
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
0.663
| 527.219971
|
Air
| 1.08
|
LPCVD
|
RIE
| 0.6
|
900C_1hr
| 1,578.670044
|
TE
| -7.61
| 65.510002
| 150.869995
| 32.889999
| 3.687
| 0.584
| 89.57
| 52.610001
| 0.392
| 1.595
| 0.827
|
BATCH_37
|
Measurement
|
OTDR
| 0.151
|
1.246
| 532
|
Air
| 3.35
|
Sputtering
|
ICP
| 1.62
|
900C_1hr
| 1,542.949951
|
TM
| -6.01
| 57.709999
| 68.370003
| 29.1
| 10.55
| 3.389
| 79.949997
| 45.619999
| 0.023
| 1.557
| 0.824
|
BATCH_23
|
Synthetic
|
microring_Q
| 0.098
|
0.755
| 323.630005
|
SiO2
| 4.45
|
PECVD
|
RIE
| 3.83
|
1000C_1hr
| 1,508.900024
|
TM
| -5.94
| 55.830002
| 143.550003
| 5.08
| 2.599
| 2.965
| 68.089996
| 81.32
| 0.025
| 1.635
| 0.838
|
BATCH_3
|
Synthetic
|
cut-back
| 0.082
|
1.67
| 506.220001
|
Air
| 3.75
|
Sputtering
|
ICP
| 4.27
|
900C_1hr
| 1,506.5
|
TE
| 3.98
| 53.459999
| 191.970001
| 35.470001
| 9.543
| 2.383
| 77.510002
| 50.450001
| 0.168
| 1.692
| 0.759
|
BATCH_15
|
Synthetic
|
ring_resonance
| 0.136
|
1.968
| 289.790009
|
Polymer
| 2.55
|
Sputtering
|
RIE
| 2.82
|
900C_1hr
| 1,540.959961
|
TM
| -6.23
| 23.58
| 192.440002
| 4.58
| 3.121
| 3.458
| 65.75
| 56.990002
| 0.272
| 1.589
| 0.909
|
BATCH_5
|
Measurement
|
microring_Q
| 0.045
|
1.654
| 343.589996
|
Polymer
| 1.06
|
LPCVD
|
RIE
| 4.31
|
No_Anneal
| 1,526.72998
|
TM
| -7.26
| 56.779999
| 133.520004
| 31.85
| 2.375
| 0.176
| 72.239998
| 54.950001
| 0.051
| 1.839
| 0.822
|
BATCH_26
|
Measurement
|
cut-back
| 0.087
|
0.901
| 275.109985
|
Air
| 1.34
|
LPCVD
|
ICP
| 1.74
|
900C_1hr
| 1,554.849976
|
TM
| -6.17
| 53.060001
| 96.949997
| 14.65
| 2.957
| 1.016
| 86.150002
| 82.730003
| 0.38
| 1.818
| 0.796
|
BATCH_22
|
Measurement
|
cut-back
| 0.167
|
1.428
| 593.599976
|
Air
| 3.81
|
Sputtering
|
RIE
| 2.7
|
900C_1hr
| 1,564.02002
|
TE
| 0.47
| 49.560001
| 79.089996
| 12.82
| 2.827
| 0.679
| 86.540001
| 89.75
| 0.292
| 1.653
| 0.752
|
BATCH_44
|
Measurement
|
OTDR
| 0.053
|
1.483
| 387.709991
|
Air
| 3.84
|
LPCVD
|
ICP
| 1.69
|
900C_1hr
| 1,517.170044
|
TM
| -2.77
| 52.43
| 155.720001
| 21.35
| 6.03
| 2.194
| 59.939999
| 83.949997
| 0.087
| 1.726
| 0.92
|
BATCH_19
|
Measurement
|
ring_resonance
| 0.023
|
1.208
| 465.76001
|
SiO2
| 3.43
|
LPCVD
|
RIE
| 1.64
|
900C_3hr
| 1,583.689941
|
TE
| -5.33
| 66.389999
| 162.309998
| 12.77
| 4.787
| 2.329
| 63.139999
| 72.309998
| 0.191
| 1.885
| 0.798
|
BATCH_38
|
Synthetic
|
OTDR
| 0.071
|
1.719
| 424.01001
|
Air
| 4.59
|
PECVD
|
RIE
| 3.43
|
900C_3hr
| 1,542.089966
|
TM
| 3.85
| 40.459999
| 24.190001
| 45.599998
| 7.551
| 1.4
| 60.169998
| 80.260002
| 0.482
| 1.614
| 0.921
|
BATCH_22
|
Measurement
|
cut-back
| 0.142
|
1.926
| 438.769989
|
Polymer
| 4.43
|
PECVD
|
ICP
| 2.51
|
No_Anneal
| 1,537.27002
|
TE
| -4.16
| 59.709999
| 26.59
| 47.009998
| 16.572001
| 3.102
| 49.040001
| 84.419998
| 0.253
| 1.644
| 0.732
|
BATCH_9
|
Synthetic
|
OTDR
| 0.102
|
0.752
| 588.710022
|
SiO2
| 1.4
|
PECVD
|
Wet Etch
| 1.26
|
No_Anneal
| 1,564.569946
|
TM
| -8.65
| 72.010002
| 159.610001
| 28.65
| 10.18
| 2.87
| 44.169998
| 63.25
| 0.48
| 1.899
| 0.927
|
BATCH_6
|
Measurement
|
microring_Q
| 0.169
|
0.82
| 239
|
Polymer
| 3.9
|
PECVD
|
Wet Etch
| 3.89
|
900C_1hr
| 1,522.359985
|
TE
| 2.35
| 68.089996
| 63.959999
| 5.41
| 3.645
| 3.915
| 59.560001
| 62.549999
| 0.032
| 1.729
| 0.764
|
BATCH_45
|
Synthetic
|
microring_Q
| 0.147
|
0.532
| 264.359985
|
SiO2
| 1.06
|
LPCVD
|
ICP
| 4.16
|
No_Anneal
| 1,538.790039
|
TM
| -6.77
| 26.950001
| 29.5
| 39.240002
| 9.282
| 2.039
| 81.150002
| 50.400002
| 0.042
| 1.674
| 0.87
|
BATCH_17
|
Measurement
|
OTDR
| 0.174
|
1.616
| 311.799988
|
Air
| 3.02
|
PECVD
|
Wet Etch
| 0.58
|
1000C_1hr
| 1,533.48999
|
TM
| -1.8
| 44.93
| 38.720001
| 11.32
| 6.845
| 4.536
| 58.540001
| 70.260002
| 0.112
| 1.883
| 0.736
|
BATCH_28
|
Measurement
|
OTDR
| 0.094
|
0.766
| 380.559998
|
SiO2
| 2.7
|
LPCVD
|
ICP
| 0.95
|
900C_1hr
| 1,569.859985
|
TE
| -3.71
| 46.419998
| 67.790001
| 34.990002
| 5.328
| 1.099
| 74.089996
| 78.68
| 0.185
| 1.848
| 0.733
|
BATCH_13
|
Measurement
|
OTDR
| 0.12
|
0.905
| 210.830002
|
Polymer
| 2.37
|
PECVD
|
Wet Etch
| 2.31
|
900C_3hr
| 1,511.420044
|
TE
| -5.16
| 30.030001
| 72.230003
| 45.41
| 10.023
| 1.861
| 84.330002
| 51.959999
| 0.269
| 1.544
| 0.935
|
BATCH_45
|
Measurement
|
microring_Q
| 0.143
|
1.038
| 395.690002
|
Polymer
| 4.41
|
Sputtering
|
RIE
| 4.19
|
900C_3hr
| 1,545.48999
|
TM
| -6.64
| 28.200001
| 145.679993
| 29.219999
| 12.599
| 4.11
| 78.93
| 40.639999
| 0.197
| 1.762
| 0.787
|
BATCH_10
|
Measurement
|
OTDR
| 0.018
|
1.753
| 536.22998
|
SiO2
| 3.65
|
PECVD
|
RIE
| 2.48
|
900C_3hr
| 1,520.920044
|
TE
| -5.57
| 22.15
| 166.029999
| 19.709999
| 5.816
| 2.107
| 46.34
| 40.91
| 0.229
| 1.775
| 0.84
|
BATCH_50
|
Measurement
|
ring_resonance
| 0.115
|
1.386
| 233.630005
|
Polymer
| 2.65
|
PECVD
|
RIE
| 3.36
|
900C_1hr
| 1,557.48999
|
TM
| 0.68
| 70.279999
| 168.199997
| 28.6
| 14.47
| 4.685
| 40.099998
| 47.540001
| 0.315
| 1.52
| 0.794
|
BATCH_17
|
Measurement
|
microring_Q
| 0.066
|
1.447
| 562.539978
|
SiO2
| 2.97
|
Sputtering
|
ICP
| 4.11
|
900C_3hr
| 1,537.369995
|
TE
| -3.08
| 28.389999
| 114.779999
| 34.169998
| 6.386
| 1.703
| 89.260002
| 57.91
| 0.395
| 1.593
| 0.806
|
BATCH_21
|
Measurement
|
OTDR
| 0.13
|
1.671
| 388.019989
|
Polymer
| 1.76
|
Sputtering
|
RIE
| 3.17
|
900C_3hr
| 1,597.01001
|
TE
| -5.56
| 72.940002
| 152.470001
| 10.36
| 2.171
| 0.175
| 45.73
| 60.23
| 0.034
| 1.595
| 0.881
|
BATCH_38
|
Measurement
|
cut-back
| 0.051
|
0.979
| 545.440002
|
SiO2
| 4.72
|
PECVD
|
Wet Etch
| 4.57
|
900C_3hr
| 1,570.650024
|
TE
| -7.76
| 35.34
| 196.009995
| 30.34
| 14.377
| 4.535
| 79.809998
| 40.639999
| 0.414
| 1.79
| 0.839
|
BATCH_3
|
Synthetic
|
cut-back
| 0.072
|
1.072
| 325.029999
|
Polymer
| 3.89
|
LPCVD
|
ICP
| 0.96
|
No_Anneal
| 1,583.369995
|
TE
| 3.48
| 69.870003
| 101.300003
| 9.86
| 2.53
| 1.478
| 56.23
| 52.209999
| 0.105
| 1.586
| 0.773
|
BATCH_41
|
Synthetic
|
microring_Q
| 0.025
|
0.884
| 295.269989
|
Air
| 3.87
|
LPCVD
|
RIE
| 2.76
|
900C_3hr
| 1,599.800049
|
TM
| 2.98
| 56.400002
| 60.869999
| 8.69
| 1.268
| 0.485
| 65.370003
| 80.220001
| 0.382
| 1.913
| 0.92
|
BATCH_34
|
Measurement
|
microring_Q
| 0.113
|
1.281
| 331.369995
|
SiO2
| 2.94
|
PECVD
|
Wet Etch
| 4.91
|
No_Anneal
| 1,561.01001
|
TE
| 3.28
| 64.940002
| 130.889999
| 8.25
| 5.135
| 4.553
| 81.150002
| 84.099998
| 0.322
| 1.972
| 0.921
|
BATCH_34
|
Synthetic
|
microring_Q
| 0.142
|
1.631
| 383.079987
|
Polymer
| 2.15
|
LPCVD
|
Wet Etch
| 0.53
|
900C_1hr
| 1,547.300049
|
TM
| 7.7
| 65.099998
| 80.769997
| 16.83
| 6.746
| 2.957
| 89.260002
| 49.779999
| 0.453
| 1.505
| 0.758
|
BATCH_11
|
Measurement
|
OTDR
| 0.04
|
1.803
| 548.700012
|
SiO2
| 2.68
|
PECVD
|
Wet Etch
| 3.27
|
900C_1hr
| 1,560.680054
|
TE
| -8.88
| 76.68
| 46.380001
| 26.610001
| 3.666
| 1.096
| 82.879997
| 54.369999
| 0.282
| 1.918
| 0.793
|
BATCH_26
|
Synthetic
|
cut-back
| 0.098
|
0.528
| 555.169983
|
Polymer
| 3.68
|
PECVD
|
Wet Etch
| 1.21
|
900C_3hr
| 1,568.060059
|
TE
| 6.06
| 42.57
| 159.779999
| 47.860001
| 2.108
| 0.146
| 64.089996
| 71.540001
| 0.143
| 1.578
| 0.776
|
BATCH_48
|
Synthetic
|
cut-back
| 0.098
|
1.875
| 503.809998
|
Polymer
| 1.6
|
PECVD
|
Wet Etch
| 4.4
|
No_Anneal
| 1,594.579956
|
TM
| -4.11
| 40.77
| 101.089996
| 10.32
| 1.92
| 0.705
| 41.119999
| 40.450001
| 0.354
| 1.678
| 0.788
|
BATCH_5
|
Synthetic
|
microring_Q
| 0.102
|
1.602
| 201.820007
|
Air
| 1.91
|
LPCVD
|
Wet Etch
| 1.91
|
No_Anneal
| 1,557.27002
|
TE
| 0.45
| 24.879999
| 166.630005
| 31.26
| 6.71
| 1.552
| 43.57
| 68.669998
| 0.205
| 1.666
| 0.94
|
BATCH_25
|
Measurement
|
microring_Q
| 0.175
|
1.168
| 447.029999
|
Air
| 2.79
|
PECVD
|
Wet Etch
| 3.23
|
900C_3hr
| 1,563.390015
|
TE
| 9.07
| 47.52
| 78.480003
| 9.37
| 5.298
| 3.57
| 74.209999
| 53.889999
| 0.49
| 1.664
| 0.946
|
BATCH_15
|
Measurement
|
cut-back
| 0.092
|
1.62
| 282.649994
|
Polymer
| 4.73
|
LPCVD
|
ICP
| 1.54
|
No_Anneal
| 1,513.719971
|
TM
| -8.44
| 41.830002
| 65.160004
| 20.110001
| 8.411
| 3.787
| 73.360001
| 83.290001
| 0.443
| 1.895
| 0.762
|
BATCH_35
|
Synthetic
|
ring_resonance
| 0.177
|
0.635
| 395.959991
|
Air
| 2.55
|
Sputtering
|
ICP
| 1.45
|
1000C_1hr
| 1,588.410034
|
TM
| 7.54
| 35.77
| 75.910004
| 13.4
| 3.487
| 1.463
| 84.099998
| 46.860001
| 0.13
| 1.949
| 0.927
|
BATCH_37
|
Measurement
|
ring_resonance
| 0.17
|
1.161
| 317.609985
|
Air
| 3.34
|
Sputtering
|
ICP
| 2.52
|
1000C_1hr
| 1,577.560059
|
TM
| -8.94
| 40.93
| 108.82
| 16.139999
| 7.945
| 3.885
| 70.260002
| 53.07
| 0.283
| 1.854
| 0.737
|
BATCH_23
|
Measurement
|
cut-back
| 0.061
|
1.223
| 451.700012
|
Air
| 4.56
|
PECVD
|
Wet Etch
| 2.23
|
1000C_1hr
| 1,573.170044
|
TE
| -4.45
| 72.410004
| 77.089996
| 25.129999
| 4.678
| 1.458
| 77.059998
| 89.879997
| 0.354
| 1.54
| 0.757
|
BATCH_2
|
Synthetic
|
ring_resonance
| 0.097
|
1.973
| 555.840027
|
Polymer
| 4.59
|
Sputtering
|
Wet Etch
| 0.78
|
No_Anneal
| 1,502.280029
|
TM
| 8.91
| 30.860001
| 32.889999
| 20.559999
| 1.917
| 0.267
| 78.580002
| 51.48
| 0.203
| 1.696
| 0.803
|
BATCH_20
|
Measurement
|
cut-back
| 0.075
|
1.141
| 576.820007
|
SiO2
| 3.53
|
PECVD
|
ICP
| 3.92
|
No_Anneal
| 1,569.25
|
TM
| 5.95
| 58.950001
| 184.729996
| 38.700001
| 2.554
| 0.152
| 53.049999
| 66.419998
| 0.495
| 1.627
| 0.788
|
BATCH_29
|
Synthetic
|
microring_Q
| 0.095
|
0.908
| 371
|
Air
| 1.52
|
LPCVD
|
RIE
| 1.57
|
1000C_1hr
| 1,546.209961
|
TE
| 2.18
| 55.150002
| 167.919998
| 19.040001
| 3.871
| 1.568
| 75.339996
| 70.879997
| 0.28
| 1.592
| 0.745
|
BATCH_39
|
Measurement
|
cut-back
| 0.138
|
0.628
| 290.130005
|
SiO2
| 4.1
|
LPCVD
|
ICP
| 3.52
|
1000C_1hr
| 1,519.849976
|
TM
| -7.74
| 20.85
| 198.839996
| 31.27
| 4.341
| 1.12
| 80.889999
| 51.130001
| 0.231
| 1.719
| 0.896
|
BATCH_46
|
Synthetic
|
OTDR
| 0.124
|
1.246
| 271.179993
|
Air
| 4.19
|
Sputtering
|
RIE
| 4.91
|
1000C_1hr
| 1,502.930054
|
TM
| 0.3
| 62.57
| 50.43
| 26.82
| 3.095
| 0.543
| 42.82
| 46.709999
| 0.242
| 1.793
| 0.929
|
BATCH_3
|
Synthetic
|
OTDR
| 0.017
|
1.32
| 268.75
|
Air
| 4.53
|
LPCVD
|
Wet Etch
| 0.91
|
900C_1hr
| 1,539.079956
|
TM
| -1.45
| 26.58
| 25.26
| 8.39
| 3.79
| 3.226
| 88.32
| 55.709999
| 0.012
| 1.884
| 0.926
|
BATCH_11
|
Synthetic
|
OTDR
| 0.046
|
0.905
| 368.75
|
Polymer
| 2.7
|
PECVD
|
ICP
| 2.89
|
900C_1hr
| 1,530.439941
|
TM
| 1.8
| 66.940002
| 188.220001
| 1.82
| 1.523
| 1.494
| 43.669998
| 61.959999
| 0.487
| 1.824
| 0.777
|
BATCH_26
|
Synthetic
|
ring_resonance
| 0.045
|
1.298
| 554.599976
|
Polymer
| 4.72
|
LPCVD
|
ICP
| 3.15
|
900C_3hr
| 1,515.930054
|
TE
| 2.17
| 68.910004
| 179.789993
| 13.54
| 7.321
| 4.727
| 47.84
| 49.549999
| 0.046
| 1.984
| 0.884
|
BATCH_14
|
Synthetic
|
microring_Q
| 0.115
|
1.353
| 377.029999
|
Air
| 1.07
|
LPCVD
|
ICP
| 2.48
|
900C_1hr
| 1,516.76001
|
TE
| 7.52
| 24.700001
| 88.519997
| 27.879999
| 2.903
| 0.568
| 82.220001
| 70.339996
| 0.323
| 1.958
| 0.733
|
BATCH_43
|
Measurement
|
ring_resonance
| 0.024
|
1.703
| 220.949997
|
SiO2
| 2
|
LPCVD
|
RIE
| 3.71
|
900C_1hr
| 1,587.069946
|
TE
| 9.45
| 39.209999
| 198.389999
| 33.5
| 8.01
| 2.031
| 60.91
| 70.120003
| 0.139
| 1.956
| 0.933
|
BATCH_34
|
Synthetic
|
cut-back
| 0.159
|
1.297
| 221.399994
|
SiO2
| 1.62
|
LPCVD
|
Wet Etch
| 0.85
|
1000C_1hr
| 1,559.319946
|
TE
| -7.58
| 23.08
| 195.100006
| 44.040001
| 12.671
| 2.699
| 89.879997
| 82.190002
| 0.098
| 1.587
| 0.91
|
BATCH_16
|
Synthetic
|
microring_Q
| 0.154
|
1.35
| 326.619995
|
SiO2
| 2.21
|
LPCVD
|
Wet Etch
| 3.34
|
No_Anneal
| 1,504.290039
|
TE
| -3.45
| 61.439999
| 41.970001
| 11.15
| 5.127
| 2.828
| 71.190002
| 58.02
| 0.403
| 1.507
| 0.73
|
BATCH_17
|
Synthetic
|
microring_Q
| 0.193
|
1.124
| 420.109985
|
Air
| 2.04
|
PECVD
|
RIE
| 1.7
|
1000C_1hr
| 1,598.22998
|
TE
| 6.07
| 78.260002
| 47.990002
| 47.849998
| 18.966999
| 3.776
| 42.25
| 73.43
| 0.351
| 1.778
| 0.921
|
BATCH_19
|
Measurement
|
microring_Q
| 0.076
|
1.64
| 583.210022
|
Polymer
| 3.45
|
Sputtering
|
ICP
| 4.55
|
No_Anneal
| 1,538.790039
|
TE
| -6.84
| 20.73
| 186.5
| 18.860001
| 7.668
| 3.456
| 44.900002
| 74.220001
| 0.3
| 1.914
| 0.815
|
BATCH_18
|
Synthetic
|
OTDR
| 0.066
|
1.661
| 501.600006
|
Polymer
| 4.55
|
PECVD
|
Wet Etch
| 3.59
|
No_Anneal
| 1,559.25
|
TM
| 4.58
| 73.919998
| 87.769997
| 14.19
| 1.859
| 0.153
| 57.09
| 70.089996
| 0.414
| 1.792
| 0.889
|
BATCH_19
|
Measurement
|
ring_resonance
| 0.099
|
1.017
| 474.429993
|
Polymer
| 1.91
|
PECVD
|
RIE
| 1.9
|
900C_1hr
| 1,543.089966
|
TM
| -3.29
| 46.470001
| 126.339996
| 9.95
| 1.92
| 0.537
| 56.189999
| 44.869999
| 0.118
| 1.919
| 0.926
|
BATCH_39
|
Measurement
|
ring_resonance
| 0.152
|
1.357
| 400.119995
|
Air
| 1.14
|
PECVD
|
Wet Etch
| 3.08
|
1000C_1hr
| 1,554.439941
|
TM
| -1.96
| 20.309999
| 189.830002
| 7.19
| 2.762
| 1.253
| 81.639999
| 42.849998
| 0.364
| 1.622
| 0.908
|
BATCH_45
|
Synthetic
|
OTDR
| 0.046
|
1.998
| 318.779999
|
SiO2
| 1.32
|
LPCVD
|
ICP
| 3.92
|
No_Anneal
| 1,568.040039
|
TE
| -2.52
| 26.889999
| 83.580002
| 5.4
| 2.113
| 1.794
| 48.07
| 58.389999
| 0.054
| 1.919
| 0.806
|
BATCH_47
|
Measurement
|
cut-back
| 0.089
|
1.387
| 560.960022
|
Polymer
| 3.59
|
Sputtering
|
Wet Etch
| 4.34
|
No_Anneal
| 1,591.23999
|
TE
| 7.24
| 22.32
| 130.460007
| 28.129999
| 4.817
| 1.098
| 54.869999
| 86.080002
| 0.073
| 1.987
| 0.735
|
BATCH_45
|
Synthetic
|
OTDR
| 0.134
|
1.017
| 513.609985
|
SiO2
| 2.37
|
LPCVD
|
RIE
| 4.08
|
900C_3hr
| 1,524.300049
|
TM
| -4.85
| 32.880001
| 99.419998
| 42.880001
| 12.361
| 2.579
| 43.98
| 85.510002
| 0.36
| 1.586
| 0.864
|
BATCH_12
|
Measurement
|
microring_Q
| 0.104
|
1.282
| 379.040009
|
Polymer
| 3.95
|
LPCVD
|
Wet Etch
| 0.51
|
900C_3hr
| 1,558.030029
|
TM
| -8.02
| 78.650002
| 111.519997
| 47.130001
| 20.554001
| 3.97
| 56.43
| 59.77
| 0.256
| 1.748
| 0.74
|
BATCH_48
|
Measurement
|
ring_resonance
| 0.017
|
0.764
| 467.380005
|
Polymer
| 4.21
|
Sputtering
|
RIE
| 3.21
|
1000C_1hr
| 1,560.550049
|
TM
| -3.86
| 57.990002
| 84.599998
| 47.77
| 21.856001
| 4.195
| 87.379997
| 60.18
| 0.059
| 1.823
| 0.923
|
BATCH_38
|
Measurement
|
microring_Q
| 0.139
|
1.998
| 321.859985
|
Air
| 2.03
|
Sputtering
|
RIE
| 1.86
|
No_Anneal
| 1,570.859985
|
TM
| -2.56
| 44.450001
| 53.48
| 9.19
| 4.638
| 4.186
| 55.68
| 59.07
| 0.484
| 1.875
| 0.86
|
BATCH_15
|
Synthetic
|
cut-back
| 0.172
|
1.309
| 313.309998
|
SiO2
| 3.92
|
LPCVD
|
ICP
| 4.43
|
900C_3hr
| 1,516.089966
|
TE
| -7.58
| 67.93
| 180.050003
| 18.610001
| 5.388
| 2.258
| 84.279999
| 42.41
| 0.489
| 1.802
| 0.751
|
BATCH_38
|
Measurement
|
ring_resonance
| 0.13
|
0.915
| 430.850006
|
SiO2
| 4.94
|
Sputtering
|
RIE
| 2.99
|
900C_3hr
| 1,543.180054
|
TE
| 7.12
| 41.790001
| 26.700001
| 2.93
| 2.401
| 4.391
| 58.669998
| 40.09
| 0.252
| 1.814
| 0.759
|
BATCH_10
|
Measurement
|
microring_Q
| 0.078
|
1.847
| 528.530029
|
SiO2
| 3.58
|
LPCVD
|
ICP
| 4.64
|
No_Anneal
| 1,566.040039
|
TM
| -3.43
| 30.32
| 81.400002
| 14.13
| 6.865
| 4.004
| 50.549999
| 43.470001
| 0.405
| 1.928
| 0.814
|
BATCH_31
|
Synthetic
|
cut-back
| 0.015
|
0.782
| 241.960007
|
SiO2
| 2.38
|
Sputtering
|
Wet Etch
| 3.39
|
No_Anneal
| 1,531.73999
|
TE
| -2.34
| 57
| 159.199997
| 20.99
| 7.697
| 2.949
| 49.139999
| 50.84
| 0.453
| 1.915
| 0.837
|
BATCH_11
|
Synthetic
|
ring_resonance
| 0.095
|
1.524
| 368.859985
|
Polymer
| 4.85
|
Sputtering
|
RIE
| 3.02
|
900C_1hr
| 1,583.609985
|
TE
| 8.37
| 72.580002
| 99.489998
| 47.869999
| 11.033
| 1.98
| 72.839996
| 47.310001
| 0.068
| 1.694
| 0.753
|
BATCH_9
|
Synthetic
|
OTDR
| 0.069
|
1.756
| 550.200012
|
SiO2
| 3.17
|
LPCVD
|
ICP
| 3.9
|
900C_1hr
| 1,511.869995
|
TM
| 9.42
| 64.559998
| 68.629997
| 11.99
| 2.464
| 0.646
| 47.650002
| 58.299999
| 0.222
| 1.889
| 0.855
|
BATCH_9
|
Measurement
|
cut-back
| 0.065
|
0.907
| 359.179993
|
Air
| 4.4
|
PECVD
|
Wet Etch
| 4.65
|
No_Anneal
| 1,501.430054
|
TM
| -9.72
| 36.009998
| 104
| 31.66
| 8.389
| 2.16
| 47.59
| 86.989998
| 0.011
| 1.594
| 0.895
|
BATCH_19
|
Synthetic
|
microring_Q
| 0.19
|
1.616
| 210.100006
|
Air
| 2.42
|
LPCVD
|
ICP
| 1.76
|
1000C_1hr
| 1,517
|
TM
| -8.85
| 36.389999
| 127.32
| 17.15
| 4.353
| 1.934
| 61
| 67.709999
| 0.23
| 1.61
| 0.933
|
BATCH_39
|
Measurement
|
ring_resonance
| 0.044
|
1.084
| 239.820007
|
Polymer
| 4
|
Sputtering
|
RIE
| 1.54
|
900C_3hr
| 1,597.01001
|
TE
| -9.68
| 39.299999
| 196.089996
| 45.849998
| 10.412
| 2.151
| 86.330002
| 72.059998
| 0.487
| 1.794
| 0.735
|
BATCH_1
|
Measurement
|
ring_resonance
| 0.036
|
0.514
| 404.350006
|
Air
| 1.87
|
Sputtering
|
Wet Etch
| 2.78
|
900C_3hr
| 1,587.689941
|
TM
| -9.69
| 39.68
| 38.209999
| 16.75
| 8.78
| 4.307
| 41.93
| 52.639999
| 0.343
| 1.861
| 0.721
|
BATCH_15
|
Measurement
|
microring_Q
| 0.086
|
1.38
| 353.429993
|
SiO2
| 1.08
|
LPCVD
|
Wet Etch
| 3.67
|
900C_1hr
| 1,501.030029
|
TE
| 7.85
| 23.129999
| 57.34
| 40.799999
| 4.751
| 0.945
| 72.120003
| 60.099998
| 0.373
| 1.933
| 0.881
|
BATCH_11
|
Synthetic
|
microring_Q
| 0.104
|
1.57
| 414.140015
|
Polymer
| 3.12
|
Sputtering
|
ICP
| 0.56
|
900C_3hr
| 1,540.069946
|
TE
| -9.31
| 74.269997
| 131.279999
| 13.43
| 6.501
| 3.963
| 57.810001
| 80.690002
| 0.429
| 1.774
| 0.883
|
BATCH_26
|
Synthetic
|
cut-back
| 0.056
|
1.231
| 353.609985
|
Polymer
| 4.35
|
PECVD
|
ICP
| 4.45
|
900C_3hr
| 1,528.359985
|
TM
| 5.61
| 44.400002
| 166.929993
| 4.83
| 2.177
| 2.103
| 79.199997
| 43.09
| 0.387
| 1.782
| 0.845
|
BATCH_49
|
Synthetic
|
ring_resonance
| 0.062
|
0.613
| 232.039993
|
Polymer
| 2.22
|
Sputtering
|
ICP
| 2.05
|
900C_1hr
| 1,585.609985
|
TM
| -9.82
| 77.800003
| 139.300003
| 27.469999
| 6.038
| 1.774
| 46.82
| 46.400002
| 0.174
| 1.923
| 0.937
|
BATCH_7
|
Synthetic
|
microring_Q
| 0.164
|
1.389
| 332.76001
|
Polymer
| 3.78
|
LPCVD
|
ICP
| 4.78
|
No_Anneal
| 1,525.449951
|
TM
| -0.27
| 54.849998
| 193.229996
| 28.620001
| 13.063
| 3.867
| 61.169998
| 84.349998
| 0.097
| 1.564
| 0.71
|
BATCH_7
|
Measurement
|
microring_Q
| 0.013
|
1.12
| 417.290009
|
Air
| 1.83
|
Sputtering
|
RIE
| 3.77
|
1000C_1hr
| 1,588.199951
|
TE
| -0.59
| 74.910004
| 60.759998
| 5.76
| 3.677
| 4.472
| 68.059998
| 49.639999
| 0.047
| 1.769
| 0.706
|
BATCH_29
|
Synthetic
|
ring_resonance
| 0.154
|
0.646
| 432.779999
|
Polymer
| 4.38
|
PECVD
|
RIE
| 1.11
|
900C_3hr
| 1,521.569946
|
TM
| -7.11
| 35.529999
| 113.129997
| 5.86
| 3.12
| 2.19
| 41.07
| 51.139999
| 0.426
| 1.661
| 0.862
|
BATCH_35
|
Synthetic
|
microring_Q
| 0.098
|
0.725
| 200.509995
|
Polymer
| 1.96
|
PECVD
|
ICP
| 2.66
|
900C_3hr
| 1,501.810059
|
TM
| 2.84
| 73.900002
| 90.559998
| 41.040001
| 2.49
| 0.152
| 88.230003
| 40.740002
| 0.219
| 1.643
| 0.82
|
BATCH_40
|
Synthetic
|
microring_Q
| 0.192
|
1.584
| 387.359985
|
SiO2
| 2.76
|
Sputtering
|
Wet Etch
| 2.78
|
1000C_1hr
| 1,541.280029
|
TM
| -3.98
| 44.810001
| 89.25
| 44
| 9.903
| 2.121
| 85.75
| 76.580002
| 0.464
| 1.774
| 0.921
|
BATCH_44
|
Synthetic
|
OTDR
| 0.028
|
1.521
| 578.280029
|
SiO2
| 2.39
|
Sputtering
|
Wet Etch
| 1.35
|
No_Anneal
| 1,580.540039
|
TE
| 6.49
| 67.779999
| 115.160004
| 4.85
| 3.518
| 3.486
| 56
| 70.309998
| 0.497
| 1.625
| 0.735
|
BATCH_32
|
Measurement
|
cut-back
| 0.074
|
1.605
| 421.320007
|
Air
| 3.03
|
PECVD
|
RIE
| 1.1
|
900C_1hr
| 1,543.949951
|
TE
| 4.33
| 24.82
| 149.509995
| 31.27
| 8.335
| 2.151
| 76.730003
| 55.27
| 0.269
| 1.93
| 0.877
|
BATCH_28
|
Measurement
|
microring_Q
| 0.113
|
0.815
| 302.049988
|
Air
| 2.29
|
LPCVD
|
RIE
| 3.59
|
900C_1hr
| 1,544.76001
|
TE
| -2.22
| 42.990002
| 138.429993
| 22.35
| 11.866
| 4.479
| 84.779999
| 43.919998
| 0.105
| 1.589
| 0.777
|
BATCH_1
|
Measurement
|
microring_Q
| 0.153
|
1.934
| 272.320007
|
SiO2
| 2.78
|
LPCVD
|
Wet Etch
| 3.91
|
1000C_1hr
| 1,538.780029
|
TM
| -7.55
| 20.389999
| 144.190002
| 33.189999
| 13.821
| 3.859
| 83.93
| 81.849998
| 0.264
| 1.922
| 0.89
|
BATCH_33
|
Synthetic
|
ring_resonance
| 0.129
|
1.441
| 490.130005
|
SiO2
| 2.22
|
PECVD
|
Wet Etch
| 1.09
|
900C_1hr
| 1,507.540039
|
TM
| -1.59
| 66.940002
| 80.32
| 7.52
| 1.109
| 0.655
| 73.879997
| 82
| 0.304
| 1.844
| 0.707
|
BATCH_39
|
Measurement
|
cut-back
| 0.133
|
0.989
| 540.969971
|
SiO2
| 4.39
|
PECVD
|
ICP
| 4.34
|
1000C_1hr
| 1,524.109985
|
TE
| -1.97
| 27.65
| 71.910004
| 38.919998
| 8.382
| 2.021
| 48.689999
| 71.410004
| 0.456
| 1.775
| 0.767
|
BATCH_1
|
Measurement
|
cut-back
| 0.14
|
0.514
| 466.779999
|
Air
| 2.68
|
LPCVD
|
RIE
| 1.86
|
900C_3hr
| 1,530.73999
|
TE
| -3.56
| 27.549999
| 99.43
| 2.07
| 2.24
| 4.566
| 44.450001
| 59.040001
| 0.052
| 1.544
| 0.918
|
BATCH_22
|
Measurement
|
ring_resonance
| 0.194
|
1.24
| 200.539993
|
SiO2
| 1.54
|
PECVD
|
Wet Etch
| 1.81
|
No_Anneal
| 1,586.050049
|
TM
| 9.36
| 55.299999
| 137.399994
| 12.51
| 7.302
| 4.94
| 63.630001
| 66.580002
| 0.221
| 1.799
| 0.884
|
BATCH_20
|
Measurement
|
ring_resonance
| 0.128
|
1.629
| 525.210022
|
Polymer
| 3.97
|
LPCVD
|
Wet Etch
| 3.27
|
900C_3hr
| 1,582.469971
|
TM
| 0.87
| 49.959999
| 30.02
| 14.75
| 8.788
| 4.896
| 40.009998
| 84.550003
| 0.32
| 1.706
| 0.884
|
BATCH_26
|
Synthetic
|
cut-back
| 0.03
|
0.676
| 501.149994
|
Air
| 3.87
|
Sputtering
|
RIE
| 2
|
900C_1hr
| 1,582.26001
|
TE
| -2.78
| 78.940002
| 182.619995
| 26.58
| 12.971
| 4.189
| 56.84
| 62.310001
| 0.011
| 1.977
| 0.754
|
BATCH_41
|
Synthetic
|
OTDR
| 0.116
|
1.015
| 387.98999
|
Polymer
| 2.76
|
PECVD
|
Wet Etch
| 4.32
|
900C_3hr
| 1,558.589966
|
TM
| -0.12
| 39.060001
| 85.75
| 23.940001
| 13.49
| 4.921
| 66.800003
| 71.269997
| 0.027
| 1.648
| 0.768
|
BATCH_25
|
Measurement
|
ring_resonance
| 0.161
|
1.981
| 500.369995
|
SiO2
| 1.45
|
PECVD
|
Wet Etch
| 4.9
|
900C_3hr
| 1,515.430054
|
TE
| -5.15
| 53.77
| 61.419998
| 12.96
| 5.399
| 2.835
| 81.720001
| 86.089996
| 0.128
| 1.806
| 0.865
|
BATCH_44
|
Measurement
|
cut-back
| 0.113
|
1.529
| 202.839996
|
Polymer
| 1.75
|
LPCVD
|
ICP
| 1.47
|
1000C_1hr
| 1,567.119995
|
TM
| 0.01
| 54.459999
| 76.400002
| 19.799999
| 9.584
| 4.37
| 66.580002
| 87.400002
| 0.155
| 1.743
| 0.853
|
BATCH_29
|
Measurement
|
microring_Q
| 0.037
|
0.65
| 239.919998
|
Air
| 4.35
|
Sputtering
|
Wet Etch
| 3.89
|
No_Anneal
| 1,579.329956
|
TM
| -3.67
| 53.049999
| 105.029999
| 26.940001
| 7.314
| 2.372
| 41.759998
| 84.669998
| 0.172
| 1.842
| 0.741
|
BATCH_10
|
Synthetic
|
OTDR
| 0.104
|
1.309
| 355.720001
|
Polymer
| 3.61
|
Sputtering
|
ICP
| 2.12
|
900C_1hr
| 1,506.140015
|
TE
| -9.38
| 37.709999
| 127.330002
| 39.66
| 7.538
| 1.46
| 49.389999
| 79.57
| 0.118
| 1.647
| 0.907
|
BATCH_33
|
Synthetic
|
OTDR
| 0.155
|
0.717
| 242.919998
|
SiO2
| 4.44
|
Sputtering
|
RIE
| 2.19
|
No_Anneal
| 1,564.910034
|
TM
| -9.68
| 68.5
| 58.509998
| 6.2
| 3.505
| 3.82
| 76.209999
| 76.419998
| 0.387
| 1.509
| 0.829
|
BATCH_16
|
Measurement
|
cut-back
| 0.063
|
1.244
| 242.789993
|
Polymer
| 4.2
|
LPCVD
|
ICP
| 0.87
|
900C_3hr
| 1,584.349976
|
TE
| -1.94
| 51.439999
| 153.279999
| 8.39
| 1.615
| 1.27
| 81.290001
| 67.839996
| 0.018
| 1.605
| 0.729
|
BATCH_14
|
Measurement
|
ring_resonance
| 0.058
|
1.673
| 515.090027
|
Polymer
| 4.88
|
LPCVD
|
Wet Etch
| 3.39
|
900C_3hr
| 1,587.76001
|
TM
| -7.2
| 75.870003
| 81.529999
| 9.51
| 4.745
| 3.459
| 78.300003
| 44.650002
| 0.314
| 1.788
| 0.829
|
BATCH_41
|
Synthetic
|
ring_resonance
| 0.198
|
1.381
| 401.290009
|
SiO2
| 1.34
|
PECVD
|
Wet Etch
| 2.55
|
900C_1hr
| 1,556.310059
|
TM
| -2.57
| 26.07
| 84.739998
| 12.22
| 4.313
| 2.262
| 89.040001
| 55.459999
| 0.489
| 1.545
| 0.877
|
BATCH_44
|
Synthetic
|
microring_Q
| 0.068
|
0.986
| 335.149994
|
SiO2
| 1.48
|
PECVD
|
Wet Etch
| 3.35
|
No_Anneal
| 1,507.369995
|
TE
| -9.14
| 22.219999
| 112.029999
| 5.12
| 2.255
| 1.827
| 70.230003
| 59.689999
| 0.022
| 1.919
| 0.878
|
BATCH_49
|
Synthetic
|
ring_resonance
| 0.059
|
0.874
| 577.780029
|
SiO2
| 1.79
|
PECVD
|
ICP
| 2.12
|
No_Anneal
| 1,539.77002
|
TE
| -4.59
| 22.98
| 192.880005
| 41.599998
| 9.747
| 1.945
| 68.650002
| 79.699997
| 0.398
| 1.922
| 0.874
|
BATCH_18
|
Measurement
|
ring_resonance
| 0.118
|
SiN Photonic Waveguide Loss & Efficiency Dataset
Description
This dataset provides 90,000 synthetic rows of silicon nitride (Si₃N₄) photonic waveguide parameters, with a focus on waveguide loss and efficiency metrics. The data is useful for modeling, simulation, or LLM fine tuning to predict and understand the relationship between fabrication/design parameters and optical performance.
Key Highlights ✨
- Material Focus: Silicon Nitride (Si₃N₄)
- Columns: 25 structured columns capturing waveguide geometry, fabrication method, operation conditions, and measured synthetic performance metrics.
- Size: 90,000 rows (ideal for both training and validation splits)
- Use Cases:
- Straight and Bent Waveguide loss prediction
- Process control and optimization
- Photonic design parameter review and study
- Synthetic data augmentation for AI/ML tasks
Dataset Structure 🏗️
Each row corresponds to a single waveguide configuration or measurement instance, including:
Waveguide Geometry
- `waveguide_width (µm)
- `waveguide_height (nm or µm)
- `bend_radius (µm)
- `device_length (mm)
Material & Fabrication
cladding_materialcladding_thickness(µm)deposition_methodetch_methodsidewall_roughness(nm)annealing_params
Operational Parameters
wavelength(nm)polarization(TE/TM)input_power(dBm)temperature(°C)
Performance Metrics
insertion_loss(dB)propagation_loss(dB/cm)coupling_efficiency_input(%)coupling_efficiency_output(%)scattering_loss(dB/cm)effective_indexmode_confinement_factor(0–1)
Metadata
batch_id(fabrication batch/wafer ID)data_source(Synthetic or Measurement)measurement_method(cut-back, ring_resonance, etc)uncertainty(± dB or %)
Example Row
waveguide_width = 1.212
waveguide_height = 400.00
cladding_material = SiO2
cladding_thickness = 2.50
deposition_method = LPCVD
etch_method = RIE
sidewall_roughness = 2.05
annealing_params = 900C_3hr
wavelength = 1452.23
polarization = TE
input_power = 0.00
temperature = 25.00
bend_radius = 50.00
device_length = 10.00
insertion_loss = 3.50
propagation_loss = 0.300
coupling_efficiency_input = 72.00
coupling_efficiency_output = 68.00
scattering_loss = 0.15
effective_index = 1.800
mode_confinement_factor = 0.80
batch_id = BATCH_12
data_source = Synthetic
measurement_method = cut-back
uncertainty = 0.05
How to Use 💡
Download/Clone
- You can download the CSV file manually or use Hugging Face’s
datasetslibrary:from datasets import load_dataset dataset = load_dataset("username/SiN_Photonic_Waveguide_Loss_Efficiency")
- You can download the CSV file manually or use Hugging Face’s
Loading & Exploration
- Load into your favorite Python environment (
pandas,polars, etc.) to quickly explore the data distribution:import pandas as pd df = pd.read_csv("SiN_Photonic_Waveguide_Loss_Efficiency.csv") print(df.head())
- Load into your favorite Python environment (
Model Training
- For tasks like waveguide loss prediction, treat the waveguide geometry/fabrication columns as input features, and the
insertion_lossorpropagation_losscolumns as the labels or targets. - Example ML scenario:
features = df[[ "waveguide_width", "waveguide_height", "sidewall_roughness", "wavelength", "polarization", "temperature" ]] target = df["propagation_loss"] # Then train a regression model, e.g., scikit-learn, XGBoost, etc.
- For tasks like waveguide loss prediction, treat the waveguide geometry/fabrication columns as input features, and the
Synthetic Data Augmentation
- Use this synthetic dataset to supplement smaller real world datasets
Caveats & Limitations ⚠️
- Synthetic Nature: While ranges are inspired by real world photonic designs, actual values may differ based on specific foundries, tools, and processes.
- Statistical Simplifications: Not all real world correlations or distributions (e.g., non uniform doping profiles, advanced thermal effects) are captured.
- Measurement Noise: The
uncertaintycolumn does not fully replicate complex measurement artifacts.
License 📄
This dataset is available under the MIT License. You are free to modify, distribute, and use it for commercial or non-commercial purposes, just provide attribution.
Citation & Acknowledgments 🙌
If you use this dataset in your research or applications, please cite it as follows (example citation):
Author: https://huggingface.co/Taylor658
Title: SiN Photonic Waveguide Loss & Efficiency (Synthetic)
Year: 2025
@misc{sin_waveguide_loss_efficiency_2025,
title = {SiN Photonic Waveguide Loss & Efficiency (Synthetic)},
author = {atayloraeropsace},
year = {2025},
howpublished = {\url{https://huggingface.co/datasets/username/SiN_Photonic_Waveguide_Loss_Efficiency}}
}
Contributing 🧑💻
We welcome community contributions, ideas, and corrections:
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